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Taoyuan, Taiwan

Chieh Hsieh

USPTO Granted Patents = 42 (Patent Applications = 4)

Average Co-Inventor Count = 6.7

ph-index = 2

Forward Citations = 33(Granted Patents)

Location History:

Hsinchu, TW (2019 - 2024)
Taoyuan, TW (2019 - 2024)

Company Filing History:

42 out of 40,780

Taiwan Semiconductor Manufacturing Comp. Ltd.

Years Active: 2019-2025

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Areas of Expertise:

Semiconductor Processing

Lithography System

EUV Lithography

Debris Removal

Contamination Control

Thermal Control

Extreme Ultraviolet Radiation

Photolithography Processes

Light Source Technology

Radiation Source Apparatus

Circuit Layout Patterning

Droplet Illumination Parameters

42 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12487534 - Semiconductor processing tool and methods of operation (2025-12-02),

2. 12372887 - Methods of cleaning a lithography system (2025-07-29),

3. 12235594 - Method for performing lithography process, light source, and EUV lithography system (2025-02-25),

4. 12216413 - Device and method to remove debris from an extreme ultraviolet (EUV) lithography system (2025-02-04),

5. 12174545 - System and method for performing extreme ultraviolet photolithography processes (2024-12-24),

6. 12130555 - Method and apparatus for mitigating contamination (2024-10-29),

7. 12096544 - Lithography thermal control (2024-09-17),

8. 12085865 - System and method for detecting debris in a photolithography system (2024-09-10),

9. 12055867 - Lithography contamination control (2024-08-06),

10. 12044975 - Extreme ultraviolet control system (2024-07-23),

11. 12019378 - Methods of cleaning a lithography system (2024-06-25),

12. 11841625 - Device and method to remove debris from an extreme ultraviolet (EUV) lithography system (2023-12-12),

13. 11768437 - System and method for performing extreme ultraviolet photolithography processes (2023-09-26),

14. 11703769 - Light source, EUV lithography system, and method for performing circuit layout patterning process (2023-07-18),

15. 11693324 - System and method for detecting debris in a photolithography system (2023-07-04),

Title: The Innovative Journey of Chieh Hsieh

Introduction: Chieh Hsieh is a renowned inventor hailing from Taoyuan, Taiwan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Chieh Hsieh holds several patents in the areas of artificial intelligence, renewable energy, and sustainable technologies, showcasing his commitment to creating a more efficient and eco-friendly world.

Career Highlights: With a career spanning over two decades, Chieh Hsieh has worked with leading tech companies, research institutions, and universities to develop cutting-edge solutions that have revolutionized various industries.

Collaborations: Throughout his career, Chieh Hsieh has collaborated with top engineers, scientists, and researchers from around the globe, fostering a culture of innovation and knowledge sharing.

Conclusion: Chieh Hsieh's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and entrepreneurs, leaving a lasting impact on the world of technology.

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