The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 14, 2021
Filed:
Mar. 27, 2020
Kla-tencor Corporation, Milpitas, CA (US);
Doug K. Masnaghetti, San Jose, CA (US);
Gabor Toth, San Jose, CA (US);
David Trease, Milpitas, CA (US);
Rohit Bothra, Milpitas, CA (US);
Grace Hsiu-Ling Chen, Los Gatos, CA (US);
Rainer Knippelmeyer, Groton, MA (US);
KLA Corporation, Milpitas, CA (US);
Abstract
A scanning electron microscopy system with improved image beam stability is disclosed. The system includes an electron beam source configured to generate an electron beam and a set of electron-optical elements to direct at least a portion of the electron beam onto a portion of the sample. The system includes an emittance analyzer assembly. The system includes a splitter element configured to direct at least a portion secondary electrons and/or backscattered electrons emitted by a surface of the sample to the emittance analyzer assembly. The emittance analyzer assembly is configured to image at least one of the secondary electrons and/or the backscattered electrons.