The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2021
Filed:
Jul. 11, 2018
Asml Netherlands B.v., Veldhoven, NL;
Patrick Warnaar, Tilburg, NL;
Patricius Aloysius Jacobus Tinnemans, Hapert, NL;
Grzegorz Grzela, Eindhoven, NL;
Everhardus Cornelis Mos, Best, NL;
Wim Tjibbo Tel, Helmond, NL;
Marinus Jochemsen, Veldhoven, NL;
Bart Peter Bert Segers, Tessenderlo, BE;
Frank Staals, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method includes obtaining, for each particular feature of a plurality of features of a device pattern of a substrate being created using a patterning process, a modelled or simulated relation of a parameter of the patterning process between a measurement target for the substrate and the particular feature; and based on the relation and measured values of the parameter from the metrology target, generating a distribution of the parameter across at least part of the substrate for each of the features, the distribution for use in design, control or modification of the patterning process.