The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2021
Filed:
Oct. 30, 2019
Asml Netherlands B.v., Veldhoven, NL;
Asml Holding N.v., Veldhoven, NL;
David Ferdinand Vles, Eindhoven, NL;
Erik Achilles Abegg, Eindhoven, NL;
Aage Bendiksen, Fairfield, CT (US);
Derk Servatius Gertruda Brouns, Herentals, BE;
Pradeep K. Govil, Norwalk, CT (US);
Paul Janssen, Eindhoven, NL;
Maxim Aleksandrovich Nasalevich, Eindhoven, NL;
Arnoud Willem Notenboom, Rosmalen, NL;
Mária Péter, Eindhoven, NL;
Marcus Adrianus Van De Kerkhof, Helmond, NL;
Willem Joan Van Der Zande, Bussum, NL;
Pieter-Jan Van Zwol, Eindhoven, NL;
Johannes Petrus Martinus Bernardus Vermeulen, Leende, NL;
Willem-Pieter Voorthuijzen, 's-Hertogenbosch, NL;
James Norman Wiley, Menlo Park, CA (US);
ASML NETHERLANDS B.V., Veldhoven, NL;
ASML HOLDING N.V., Veldhoven, NL;
Abstract
A pellicle suitable for use with a patterning device for a lithographic apparatus. The pellicle comprising at least one breakage region which is configured to preferentially break, during normal use in a lithographic apparatus, prior to breakage of remaining regions of the pellicle. At least one breakage region comprises a region of the pellicle which has a reduced thickness when compared to surrounding regions of the pellicle.