The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 2020
Filed:
Jan. 20, 2016
Asml Netherlands B.v., Veldhoven, NL;
Wim Tjibbo Tel, Helmond, NL;
Marinus Jochemsen, Veldhoven, NL;
Frank Staals, Eindhoven, NL;
Christopher Prentice, Grenoble, FR;
Laurent Michel Marcel Depre, Revel, FR;
Johannes Marcus Maria Beltman, Knegsel, NL;
Roy Werkman, Eindhoven, NL;
Jochem Sebastiaan Wildenberg, Aarle-Rixtel, NL;
Everhardus Cornelis Mos, Best, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method includes determining topographic information of a substrate for use in a lithographic imaging system, determining or estimating, based on the topographic information, imaging error information for a plurality of points in an image field of the lithographic imaging system, adapting a design for a patterning device based on the imaging error information. In an embodiment, a plurality of locations for metrology targets is optimized based on imaging error information for a plurality of points in an image field of a lithographic imaging system, wherein the optimizing involves minimizing a cost function that describes the imaging error information. In an embodiment, locations are weighted based on differences in imaging requirements across the image field.