This inventor holds 3 USPTO granted patents. Top assignee: Asml Netherlands B.v.. Active years: 2020-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2020-2026
As an AI assistant specialized in innovations, inventions, inventors, patent attorneys, assignees, and patents, I can provide you with a detailed article about the inventor Laurent Michel Marcel Depre.
Title: The Innovative Work of Laurent Michel Marcel Depre
Introduction: Laurent Michel Marcel Depre is a talented inventor hailing from Revel, France. With a strong passion for technological advancements, Depre has made significant contributions to the field of lithography through his innovative patents.
Latest Patents:
1. Optimization of a Lithographic Projection Apparatus Accounting for an Interlayer Characteristic: Depre's method aims to enhance the lithographic process of imaging a design layout onto a substrate using a lithographic apparatus. By computing a multi-variable cost function that represents an interlayer characteristic, the method allows for the reconfiguration of lithographic process characteristics to improve overall performance.
2. Method and Apparatus for Reticle Optimization: In this patent, Depre introduces a method for optimizing the design of a patterning device based on imaging error information derived from topographic data of the substrate. By adapting the design and optimizing metrology target locations, the method minimizes imaging errors and improves the efficiency of the lithographic imaging system.
Career Highlights: Laurent Michel Marcel Depre is currently affiliated with ASML Netherlands B.V., a leading company in the field of lithography technology. His expertise and innovative solutions have significantly contributed to the company's success in advancing lithographic processes.
Collaborations: Depre has collaborated with esteemed colleagues such as Wim Tjibbo Tel and Jorge Humberto Salvador Entradas. Their combined efforts have led to groundbreaking developments in lithography technology, setting new standards in the industry.
Conclusion: Laurent Michel Marcel Depre's inventive spirit and dedication to advancing lithography technology have established him as a prominent figure in the field of innovations. His patents and collaborative efforts continue to shape the future of lithography, paving the way for further advancements in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile