The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2019
Filed:
Nov. 06, 2017
Kla-tencor Corporation, Milpitas, CA (US);
Bjorn Brauer, Beaverton, OR (US);
Eugene Shifrin, Sunnyvale, CA (US);
Ashok Mathew, Fremont, CA (US);
Chetana Bhaskar, San Jose, CA (US);
Lisheng Gao, Saratoga, CA (US);
Santosh Bhattacharyya, San Jose, CA (US);
Hucheng Lee, Cupertino, CA (US);
Benjamin Murray, Portland, OR (US);
KLA-Tencor Corp., Milpitas, CA (US);
Abstract
Systems and methods for detecting defects on a reticle are provided. One system includes computer subsystem(s) that include one or more image processing components that acquire images generated by an inspection subsystem for a wafer, a main user interface component that provides information generated for the wafer and the reticle to a user and receives instructions from the user, and an interface component that provides an interface between the one or more image processing components and the main user interface. Unlike currently used systems, the one or more image processing components are configured for performing repeater defect detection by applying a repeater defect detection algorithm to the images acquired by the one or more image processing components, and the repeater defect detection algorithm is configured to detect defects on the wafer using a hot threshold and to identify the defects that are repeater defects.