The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 25, 2019

Filed:

Apr. 12, 2018
Applicants:

United Microelectronics Corp., Hsin-Chu, TW;

Fujian Jinhua Integrated Circuit Co., Ltd., Quanzhou, Fujian Province, CN;

Inventors:

Ger-Pin Lin, Tainan, TW;

Tien-Chen Chan, Tainan, TW;

Shu-Yen Chan, Changhua County, TW;

Chi-Mao Hsu, Tainan, TW;

Shih-Fang Tzou, Tainan, TW;

Ting-Pang Chung, Taichung, TW;

Chia-Wei Wu, Taichung, TW;

Assignees:

UNITED MICROELECTRONICS CORP., Hsin-Chu, TW;

Fujian Jinhua Integrated Circuit Co., Ltd., Quanzhou, Fujian Province, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 27/108 (2006.01); H01L 21/02 (2006.01); H01L 21/324 (2006.01); H01L 21/48 (2006.01); H01L 21/762 (2006.01);
U.S. Cl.
CPC ...
H01L 27/10873 (2013.01); H01L 21/02532 (2013.01); H01L 21/02543 (2013.01); H01L 21/02576 (2013.01); H01L 21/324 (2013.01); H01L 21/4814 (2013.01); H01L 21/762 (2013.01);
Abstract

A method of manufacturing a semiconductor device is provided, which includes the steps of providing a capacitor structure, forming a conductive layer on the capacitor structure, performing a hydrogen doping process to the conductive layer, forming a metal layer on the conductive layer after the hydrogen doping process, and patterning the metal layer and the conductive layer to forma top electrode plate.


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