The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 28, 2019
Filed:
Sep. 14, 2015
Nova Measuring Instruments Ltd., Rehovot, IL;
Global Foundries, Malta, NY (US);
Gilad Wainreb, Tel Aviv, IL;
Etai Littwin, Yavne, IL;
Alok Vaid, Ballston Lake, NY (US);
Michael Klots, Givatayim, IL;
Cornel Bozdog, San Jose, CA (US);
Matthew Sendelbach, Fishkill, NY (US);
NOVA MEASURING INSTRUMENTS LTD., Rehovot, IL;
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Abstract
A method and system are presented for use in model-based optical measurements in patterned structures. The method comprises: selecting an optimal optical model for interpretation of optical measured data indicative of optical response of the structure under measurements. The selection of the optimal optical model comprises: creating a complete optical model with floating parameters defining multiple configurations of said complete model including one or more model configurations describing an optical response of the structure under measurements, utilizing the complete model for predicting a reference optical response from the structure and generating corresponding virtual reference data, and using the virtual reference data for selecting the optimal optical model for interpretation of the optical measured data.