Michael Klots

Title: Michael Klots: Innovator in Optical Measurement Technologies

Introduction

Michael Klots is a notable inventor based in Givatayim, Israel. He has made significant contributions to the field of optical measurements, particularly through his innovative patent. His work has implications for various industries that rely on precise optical measurements in patterned structures.

Latest Patents

Michael Klots holds a patent for a "Scatterometry method and system." This method and system are designed for model-based optical measurements in patterned structures. The process involves selecting an optimal optical model to interpret optical measured data indicative of the structure's optical response. The selection process includes creating a complete optical model with floating parameters that define multiple configurations, predicting a reference optical response, and generating corresponding virtual reference data. This data is then utilized to select the optimal optical model for interpreting the measured data.

Career Highlights

Throughout his career, Michael Klots has worked with prominent companies in the technology sector. He has been associated with Nova Measuring Instruments Ltd. and Globalfoundries Inc., where he has applied his expertise in optical measurement technologies. His experience in these companies has allowed him to refine his skills and contribute to advancements in the field.

Collaborations

Michael has collaborated with several professionals in his field, including Gilad Wainreb and Etai Littwin. These collaborations have fostered innovation and have been instrumental in the development of new technologies.

Conclusion

Michael Klots is a distinguished inventor whose work in optical measurement technologies has made a significant impact. His patent for the scatterometry method and system exemplifies his innovative approach to solving complex problems in the industry. His contributions continue to influence advancements in optical measurements.