The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 31, 2018
Filed:
May. 15, 2015
Tokyo Electron Limited, Tokyo, JP;
Kazuya Koyama, Koshi, JP;
Hiromi Kiyose, Koshi, JP;
Katsufumi Matsuki, Koshi, JP;
Shuhei Takahashi, Koshi, JP;
Hideki Nishimura, Koshi, JP;
Takashi Uno, Koshi, JP;
Hirotaka Maruyama, Koshi, JP;
Tokyo Electron Limited, Minato-ku, JP;
Abstract
A substrate liquid treatment apparatus includes: at least one processing unit that processes a substrate with a treatment liquid; a storage tank that stores the treatment liquid; a circulation line through which the treatment liquid discharged from the storage tank into the circulation line is returned to the storage tank; a branch supply line that is branched from the circulation line to supply the treatment liquid to the processing unit; a recovery line that returns to the storage tank the treatment liquid having been supplied to the substrate in the processing unit; a distribution line connecting the circulation line and the recovery line; and a shutoff valve, provided on the distribution line, that is opened when cleaning of the recovery line is performed.