Shuhei Takahashi

Title: Innovations by Shuhei Takahashi

Introduction

Shuhei Takahashi is a notable inventor based in Koshi, Japan. He has made significant contributions to the field of substrate processing, holding a total of 3 patents. His work focuses on methods and apparatuses that enhance the efficiency and effectiveness of substrate processing in microelectronics.

Latest Patents

One of his latest patents is a substrate processing method and substrate processing apparatus. This method includes an etching process, a temperature-difference forming process, and a rinsing process. The etching process involves supplying an etchant onto a first surface of a substrate to etch a pattern. The temperature-difference forming process creates a temperature gradient, making the lower portion of the pattern cooler than the upper portion. Finally, the rinsing process replaces the remaining etchant with rinse liquid after the etching process.

Another significant patent is a method of treating a microelectronic substrate using dilute TMAH. This method involves receiving a microelectronic substrate into a process chamber, where a treatment solution is applied to etch silicon features. The treatment solution consists of a dilution solution and TMAH, with controlled oxygen content to achieve target etch selectivity and uniformity.

Career Highlights

Shuhei Takahashi is currently associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His innovative approaches have contributed to advancements in substrate processing technologies.

Collaborations

He has collaborated with notable coworkers, including Hideki Nishimura and Kazuya Koyama, to further enhance the development of substrate processing methods.

Conclusion

Shuhei Takahashi's contributions to substrate processing through his patents and collaborations highlight his role as a significant inventor in the field of microelectronics. His innovative methods continue to influence the industry positively.