Company Filing History:
Years Active: 2016-2018
Title: The Innovative Mind of Katsufumi Matsuki
Introduction: Katsufumi Matsuki, an accomplished inventor based in Koshi, Japan, has made significant contributions to the field of substrate liquid treatment technology. With a total of two patents to his name, Matsuki's work demonstrates a passion for innovation and a commitment to advancing the capabilities of substrate processing systems.
Latest Patents: Matsuki's latest patents include a "Substrate Liquid Treatment Apparatus" and a "Method of Cleaning Substrate Liquid Treatment Apparatus and Non-Transitory Storage Medium." The substrate liquid treatment apparatus features several vital components, including at least one processing unit for processing substrates with treatment liquids, a storage tank for storing the treatment liquid, and a circulation line that ensures effective recycling of the treatment solution. Additionally, the method of cleaning emphasizes the importance of maintaining the operational efficiency of the apparatus, incorporating innovative features such as a shutoff valve for cleaner operation.
His other notable patent outlines a substrate processing method and storage medium that stores a computer program. This innovation involves a multi-step process where a chemical liquid is applied to a substrate, followed by rinsing and drying processes that optimize the drying procedure through systematic rotational speeds to ensure effective cleaning and drying of the substrate.
Career Highlights: Matsuki currently works with Tokyo Electron Limited, a leading provider of semiconductor manufacturing equipment. His contributions to the company reflect his expertise in substrate processing technologies and demonstrate the practical applications of his innovative ideas in the semiconductor industry.
Collaborations: In his pursuit of innovation, Matsuki collaborates with notable colleagues such as Kazuya Koyama and Hiromi Kiyose. Together, they contribute to the advancement of technology in substrate processing and treatment methods, fostering an environment of collective expertise and creativity.
Conclusion: Katsufumi Matsuki's contributions to the field of substrate liquid treatment exemplify the impact of innovation in technology. Through his patents and collaborative efforts, he continues to push the boundaries of what is possible in the semiconductor industry, reinforcing the importance of continuous improvement and advancement in processing methods. His work not only highlights his inventive spirit but also serves as an inspiration for future generations of inventors and innovators.