Tokyo Electron Limited

Katsufumi Matsuki

Satoru Tanaka

Teruomi Minami

Yosuke Kawabuchi

Hiromi Kiyose

Hirotaka Maruyama

Tsukasa Hirayama

Kazuya Koyama

Takashi Uno

Hiroyuki Suzuki

Hideki Nishimura

Tatsuya Nagamatsu

Shuhei Takahashi

A substrate liquid treatment apparatus includes: at least one processing unit that processes a substrate with a treatment liquid; a storage tank that stores the treatment liquid; a circulation line through which the treatment liquid discharged from the storage tank into the circulation line is returned to the storage tank; a branch supply line that is branched from the circulation line to supply the treatment liquid to the processing unit; a recovery line that returns to the storage tank the treatment liquid having been supplied to the substrate in the processing unit; a distribution line connecting the circulation line and the recovery line; and a shutoff valve, provided on the distribution line, that is opened when cleaning of the recovery line is performed.

Substrate liquid treatment apparatus, method of cleaning substrate liquid treatment apparatus and non-transitory storage medium

A chemical liquid process is performed on a substrate. Then, a rinse process that supplies a rinse liquid to the substrate is performed. Thereafter, a drying process that dries the substrate is performed while rotating the substrate. The drying process includes a first drying process that rotates the substrate at a first rotational speed; a second drying process that decreases the rotational speed of the substrate to a second rotational speed lower than the first rotational speed after the first drying process. In the second drying process, the rinse liquid and a drying solution are agitated and substituted while generating braking effect. In a third drying process, the rotational speed of the substrate is increased from the second rotational speed to a third rotational speed after the second drying process. Thereafter, in a fourth drying process, the drying solution on the substrate is scattered away by rotating the substrate.

Substrate processing method, storage medium storing computer program for implementing substrate processing method and substrate processing apparatus

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Koshi, Japan

Katsufumi Matsuki