The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 24, 2018
Filed:
Aug. 04, 2016
Globalfoundries, Inc., Grand Cayman, KY;
Nova Measuring Instruments Ltd., Rehovot OT, IL;
Cornel Bozdog, San Jose, CA (US);
Alok Vaid, Ballston Lake, NY (US);
Sridhar Mahendrakar, Clifton Park, NY (US);
Mainul Hossain, Clifton Park, NY (US);
Taher Kagalwala, Clifton Park, NY (US);
Globalfoundries, Inc., Grand Caymen, KY;
Nova Measuring Instruments Ltd., Rehovot, IL;
Abstract
A measurement method and system are presented for in-line measurements of one or more parameters of thin films in structures progressing on a production line. First measured data and second measured data are provided from multiple measurements sites on the thin film being measured, wherein the first measured data corresponds to first type measurements from a first selected set of a relatively small number of the measurement sites, and the second measured data corresponds to second type optical measurements from a second set of significantly higher number of the measurements sites. The first measured data is processed for determining at least one value of at least one parameter of the thin film in each of the measurement sites of said first set. Such at least one parameter value is utilized for interpreting the second measured data, thereby obtaining data indicative of distribution of values of said at least one parameter within said second set of measurement sites.