Clifton Park, NY, United States of America

Sridhar Mahendrakar

USPTO Granted Patents = 2 

Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 9(Granted Patents)


Company Filing History:


Years Active: 2018-2020

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2 patents (USPTO):Explore Patents

Title: Sridhar Mahendrakar: Innovator in Semiconductor Fabrication

Introduction

Sridhar Mahendrakar is a notable inventor based in Clifton Park, NY (US). He has made significant contributions to the field of semiconductor fabrication, holding 2 patents that showcase his expertise and innovative spirit.

Latest Patents

One of his latest patents focuses on measuring complex structures in semiconductor fabrication. This patent involves measuring SRAM structures that utilize FinFET transistors. The process includes obtaining spectra from a production semiconductor wafer, identifying reference structure spectra, and determining measurement values for FinFET gates by fitting reference spectra to production structure spectra.

Another significant patent by Mahendrakar is a measurement system and method for assessing parameters of thin films in production lines. This method allows for in-line measurements, utilizing data from multiple measurement sites to interpret the distribution of values of parameters within the thin films.

Career Highlights

Sridhar has worked with prominent companies in the semiconductor industry, including GlobalFoundries Inc. and Nova Measuring Instruments Ltd. His experience in these organizations has contributed to his development as an inventor and innovator in the field.

Collaborations

Throughout his career, Mahendrakar has collaborated with talented professionals, including Alok Vaid and Taher E Kagalwala. These collaborations have likely enriched his work and led to advancements in semiconductor technology.

Conclusion

Sridhar Mahendrakar's contributions to semiconductor fabrication through his patents and career experiences highlight his role as an influential inventor in the industry. His innovative methods and systems continue to impact the field significantly.

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