Zou Zheng

Title: Innovations by Zou Zheng in Semiconductor Manufacturing

Introduction

Zou Zheng is a notable inventor based in Singapore, recognized for his contributions to the field of semiconductor manufacturing. With a total of 2 patents to his name, he has developed innovative methods that enhance the efficiency and safety of semiconductor fabrication processes.

Latest Patents

Zou Zheng's latest patents include a novel method for toxic residual gas removal by non-reactive ion sputtering. This method addresses the challenge of removing residual toxic gases trapped during the polymerizing process. By utilizing an inert ion sputter, a masking layer is formed over a semiconductor substrate, allowing for the effective desorption of toxic gas reactants. His second patent involves a method to protect the etch chamber wall from etching by endpoint plasma cleaning. This innovative approach measures light emission caused by particles within the plasma, ensuring that the cleaning process is initiated when contaminant levels are too high.

Career Highlights

Zou Zheng has made significant strides in his career at Chartered Semiconductor Manufacturing Ltd. His work focuses on improving semiconductor fabrication techniques, which are crucial for the advancement of integrated circuit devices. His innovative methods have the potential to enhance the overall safety and efficiency of semiconductor manufacturing.

Collaborations

Zou Zheng collaborates with talented individuals in his field, including Zhou Mei Sheng and Qinghua Zhong. These collaborations foster a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Zou Zheng's contributions to semiconductor manufacturing through his innovative patents demonstrate his commitment to advancing technology in this critical field. His work not only addresses current challenges but also paves the way for future advancements in semiconductor fabrication.