Zongyao Li

Title: The Innovative Mind of Zongyao Li

Introduction

Zongyao Li, an accomplished inventor based in San Jose, CA, has made significant contributions to the field of imaging technology. His work primarily focuses on charged particle beam apparatuses, a critical area in various scientific and industrial applications. With one patented invention to his name, Zongyao Li exemplifies the spirit of innovation and advancement in technology.

Latest Patents

Zongyao Li holds a patent for a “Charged particle beam apparatus with multiple detectors and methods for imaging.” This invention presents systems and methods for imaging a sample utilizing a charged-particle beam apparatus. Notably, it features a compound objective lens that combines magnetic and electrostatic lenses, enhancing imaging capabilities. The design includes a cavity containing an electron detector positioned just upstream from the magnetic lens's polepiece. This configuration allows for a large field of view and the manipulation of electron distributions among detectors without altering the landing energy, making it a versatile tool for various scientific investigations.

Career Highlights

Zongyao Li currently works at ASML Netherlands B.V., a leading company renowned for its advanced lithography systems used in semiconductor manufacturing. His role involves pushing the boundaries of technology in imaging systems, contributing to the efficiency and precision of semiconductor production processes. His dedication and expertise in his field have positioned him as a valuable resource to his team and the industry at large.

Collaborations

Throughout his career, Zongyao Li has collaborated with other talented professionals in the field, including Xuedong Liu and Weimin Zhou. These collaborations reflect a shared commitment to advancing technological innovations, enhancing the capabilities of charged-particle beam apparatus systems, and fostering a culture of teamwork and knowledge exchange that drives their projects forward.

Conclusion

Zongyao Li's contributions to the field of imaging technology, showcased through his significant patent, highlight his ingenuity and commitment to technological advancement. As part of ASML Netherlands B.V., he continues to collaborate with esteemed colleagues to explore new frontiers in imaging systems. His work serves as an inspiration for future inventors and innovators aiming to make their mark in the world of technology.