The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 12, 2024
Filed:
Apr. 08, 2021
Asml Netherlands B.v., Veldhoven, NL;
Xuedong Liu, San Jose, CA (US);
Weimin Zhou, San Jose, CA (US);
Xiaoxue Chen, Fremont, CA (US);
Xiaoyu Ji, Beijing, CN;
Heng Li, San Jose, CA (US);
Shahedul Hoque, Milpitas, CA (US);
Zongyao Li, San Jose, CA (US);
Shuhao Liu, San Jose, CA (US);
Weiming Ren, San Jose, CA (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
Systems and methods of imaging a sample using a charged-particle beam apparatus are disclosed. The charged-particle beam apparatus may include a compound objective lens comprising a magnetic lens and an electrostatic lens, the magnetic lens comprising a cavity, and an electron detector located immediately upstream from a polepiece of the magnetic lens and inside the cavity of the magnetic lens. In some embodiments, deflectors may be located between the electron detector and the opening of the polepiece adjacent to the sample to achieve a large field of view. Electron distributions among the detectors can be manipulated without changing the landing energy by changing the potential of the control electrode(s) in the electrostatic objective lens. The electron source can be operated with several discrete potentials to cover different landing energies, while the potential difference between electron source and the extractor is fixed.