This inventor holds 1 USPTO granted patent and 1 published patent application. Top assignee: Asml Netherlands B.v.. Active years: 2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2024
Title: The Innovative Contributions of Heng Li
Introduction
Heng Li is a notable inventor based in San Jose, California. He has made significant contributions to the field of imaging technology through his innovative patent. His work focuses on enhancing the capabilities of charged particle beam apparatuses, which are essential in various scientific and industrial applications.
Latest Patents
Heng Li holds a patent for a "Charged particle beam apparatus with multiple detectors and methods for imaging." This invention discloses systems and methods for imaging a sample using a charged-particle beam apparatus. The apparatus includes a compound objective lens that comprises both a magnetic lens and an electrostatic lens. The magnetic lens features a cavity, and an electron detector is strategically located upstream from the polepiece of the magnetic lens, situated within the cavity. The design allows for the manipulation of electron distributions among the detectors without altering the landing energy, providing flexibility in imaging capabilities.
Career Highlights
Heng Li is currently employed at ASML Netherlands B.V., a leading company in the field of photolithography equipment for the semiconductor industry. His work at ASML has positioned him at the forefront of technological advancements in imaging systems. With a focus on innovation, he continues to contribute to the development of cutting-edge technologies that drive the industry forward.
Collaborations
Heng Li has collaborated with esteemed colleagues such as Xuedong Liu and Weimin Zhou. Their combined expertise fosters an environment of innovation and creativity, leading to groundbreaking advancements in their respective fields.
Conclusion
Heng Li's contributions to the field of charged particle beam technology exemplify the spirit of innovation. His patent and work at ASML Netherlands B.V. highlight his commitment to advancing imaging systems. Through collaboration with talented colleagues, he continues to push the boundaries of technology and improve imaging capabilities.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile