This inventor holds 2 USPTO granted patents. Top assignees: Applied Materials, Inc., Etec Systems, Inc.. Active years: 2001-2006.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2001-2006
Title: Zoilo Cheng Ho Tan: Innovator in Photomask Technology
Introduction
Zoilo Cheng Ho Tan is a notable inventor based in Cupertino, CA. He has made significant contributions to the field of photomask technology, holding 2 patents that enhance the stability and efficiency of photoresist materials used in semiconductor manufacturing.
Latest Patents
One of his latest patents is a method of increasing the shelf life of a photomask substrate. This innovation addresses the environmental sensitivity of chemically amplified photoresists by overcoating them with a protective topcoat. The topcoat is pH adjusted to be as neutral as possible, which improves stability during the lengthy direct writing process of photomask patterns. This adjustment allows for longer storage times without adverse effects.
Another significant patent is related to a photoresist developer and method. This invention introduces an interrupted development, multi-cycle development process that utilizes an aqueous photoresist developer composition. It enables the development of electron-beam exposed novolak-resin based photoresists with exceptional resolution and contrast, making it a valuable advancement in the field.
Career Highlights
Throughout his career, Zoilo has worked with prominent companies such as Etec Systems, Inc. and Applied Materials, Inc. His experience in these organizations has contributed to his expertise in photomask technology and photoresist development.
Collaborations
He has collaborated with notable individuals in the industry, including Melvin Warren Montgomery and Jeffrey A. Albelo. These partnerships have further enriched his work and innovations in the field.
Conclusion
Zoilo Cheng Ho Tan is a distinguished inventor whose contributions to photomask technology and photoresist development have made a significant impact in the semiconductor industry. His innovative patents continue to advance the capabilities of photomask substrates and developers, showcasing his expertise and dedication to the field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile