Holon, Israel

Ziv Parizat

This inventor holds 3 USPTO granted patents. Top assignee: Applied Materials Israel Limited. Active years: 2018-2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ziv Parizat. Retrieved from https://idiyas.com/inventor/ziv-parizat

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.6

ph-index = 1

Forward Citations = 3(Granted Patents)


Location History:

  • Holon, IL (2018 - 2019)
  • Rehovot, IL (2022)

Company Filing History:


Years Active: 2018-2022

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3 patents (USPTO):Explore Patents

Title: Ziv Parizat: Innovator in Lithographic Mask Technology

Introduction

Ziv Parizat is a notable inventor based in Holon, Israel. He has made significant contributions to the field of semiconductor technology, particularly in the area of lithographic masks. With a total of 3 patents to his name, Parizat's work has advanced the methods used in defect detection and inspection processes.

Latest Patents

One of Ziv Parizat's latest patents is titled "System and methods of generating comparable regions of a lithographic mask." This patent outlines methods for generating an in-die reference for die-to-die defect detection techniques. The inspection methods utilize in-die references by identifying similar blocks of a lithographic mask, which are defined by comparable CAD information. The process involves selecting a comparison distance based on the areas and spatial relationships of these similar blocks. The aggregated similar blocks help define comparable regions of the lithographic mask, which are then inspected using an inspection module to acquire and compare images.

Another significant patent is the "System and method for design based inspection." This invention addresses the design information related to an irrelevant area of a first layer of a semiconductor article. The first layer is produced by illuminating a lithographic mask during a lithographic process. The patent details how to identify differentiating attributes that distinguish the layout of irrelevant areas from relevant ones, thereby enhancing the inspection process.

Career Highlights

Ziv Parizat is currently employed at Applied Materials Israel Limited, where he continues to innovate in the semiconductor industry. His work focuses on improving the efficiency and accuracy of lithographic processes, which are crucial for semiconductor manufacturing.

Collaborations

Throughout his career, Ziv has collaborated with talented individuals such as Moshe Rosenweig and Boaz Cohen. These collaborations have contributed to the development of advanced technologies in the field.

Conclusion

Ziv Parizat's contributions to lithographic mask technology and semiconductor inspection processes highlight his role as a leading inventor in the industry. His innovative patents and ongoing work at Applied Materials Israel Limited continue to shape the future of semiconductor manufacturing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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