The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2019
Filed:
Aug. 20, 2018
Applied Materials Israel Ltd., Rehovot, IL;
Ziv Parizat, Holon, IL;
Moshe Rosenweig, Rehovot, IL;
Applied Materials Israel LTD., Rehovot, IL;
Abstract
Design information related to an irrelevant area of a first layer of semiconductor article may be received. The first layer may be manufactured by illuminating a lithographic mask during a lithographic process. First layer information associated with an outcome or an expected outcome of the illuminating of the lithographic mask during the lithographic process may be received. Information corresponding to a layout of an irrelevant area may be identified in the first layer information. A differentiating attribute that differentiates the layout of the irrelevant area from a layout of a relevant area of the first layer of the semiconductor article may be identified. The differentiating attribute may be used to determine one or more other irrelevant areas of the first layer of the semiconductor article.