Singapore, Singapore

Zilan Li


Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2014-2016

Loading Chart...
2 patents (USPTO):Explore Patents

Title: Zilan Li: A Pioneer in Chemical Vapor Deposition Technologies

Introduction

Zilan Li is an esteemed inventor based in Singapore, recognized for her innovative contributions to the field of chemical vapor deposition technologies. With a total of two patents to her name, Zilan is a key figure in advancing techniques that enhance thin-film deposition processes, essential for various applications in electronics and materials science.

Latest Patents

Zilan Li's latest patents demonstrate her commitment to innovation. The first is a "Feed-through apparatus for a chemical vapor deposition device." This invention features a feed-through main body, multiple runner units, and a feed-through device that can rotate relative to these units. Each runner unit incorporates a fluid inlet and a spirally elongated runner designed to transport fluid, efficiently guiding chemicals into a reactor chamber.

The second patent is an "Apparatus for thin-film deposition," which focuses on depositing thin films onto substrates using precursor gases. This apparatus consists of a supporting device for the substrate and a spinner that drives the fluid flow of precursor gases. The design allows for an even distribution of gases across the substrate, showcasing Zilan's ingenuity in enhancing the thin-film deposition process.

Career Highlights

Zilan Li works for ASM Technology Singapore Pte Ltd, a reputable company in the semiconductor and materials science industries. Her work there has significantly contributed to the development of advanced semiconductor manufacturing processes. With her innovative patents, Zilan has positioned herself as a leading figure in her field, pushing the boundaries of what is possible in chemical vapor deposition technologies.

Collaborations

Throughout her career, Zilan Li has collaborated closely with talented individuals like Teng Hock Kuah and Ravindra Raghavendra. These collaborations have fostered an environment of creativity and innovation, enabling them to tackle complex challenges in the field. Together, they have worked on projects that further the advancement of deposition technologies, highlighting the importance of teamwork in the research and development sectors.

Conclusion

Zilan Li's inventive spirit and contributions to chemical vapor deposition technology underscore her role as a pivotal inventor in her field. With her patents, she continues to inspire innovation in the semiconductor and materials science industries. As she progresses in her career, Zilan's work will undoubtedly lead to further breakthroughs, solidifying her legacy as an influential figure in technological advancements.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…