The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 23, 2014

Filed:

Jun. 08, 2011
Applicants:

Zilan LI, Singapore, SG;

Teng Hock Kuah, Singapore, SG;

Jiapei Ding, Singapore, SG;

Ravindra Raghavendra, Singapore, SG;

Inventors:

Zilan Li, Singapore, SG;

Teng Hock Kuah, Singapore, SG;

Jiapei Ding, Singapore, SG;

Ravindra Raghavendra, Singapore, SG;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/458 (2006.01); C23F 1/00 (2006.01); H01L 21/306 (2006.01); C23C 16/30 (2006.01); C23C 16/06 (2006.01); C23C 16/22 (2006.01);
U.S. Cl.
CPC ...
C23C 16/303 (2013.01); C23C 16/45563 (2013.01); C23C 16/45589 (2013.01);
Abstract

An apparatusfor depositing a thin-film onto a surface of a substrateusing precursor gases G, Gis disclosed. The apparatuscomprises i) a supporting devicefor holding the substrate; and ii) a spinnerpositioned adjacent to the supporting device. Specifically, the spinnerincludes a hubfor connecting to a motor, and one or more bladesconnected to the hub. In particular, the one or more bladesare operative to rotate around the hubon a plane to drive a fluid flow of the precursor gases G, G, so as to distribute the precursor gases G, Gacross the surface of the substrate


Find Patent Forward Citations

Loading…