Asm Technology Singapore Pte Ltd

Zilan Li

Teng Hock Kuah

Ravindra Raghavendra

Jiapei Ding

Chidambaram Palaniappan

A feed-through apparatus for a chemical vapor deposition device including: a feed-through main body; a plurality of runner units; and a feed-through device rotatable with respect to the plurality of runner units within the feed-through main body. Each runner unit has a fluid inlet and an elongated runner for receiving the fluid from the fluid inlet wherein the elongated runner extends spirally on a surface of the runner unit. The feed-through device has a plurality of feed-through device orifices for receiving fluids from corresponding elongated runners during rotation of the feed-through device and has outlet-orifices for releasing the fluids into a reactor chamber.

Feed-through apparatus for a chemical vapour deposition device

An apparatusfor depositing a thin-film onto a surface of a substrateusing precursor gases G, Gis disclosed. The apparatuscomprises i) a supporting devicefor holding the substrate; and ii) a spinnerpositioned adjacent to the supporting device. Specifically, the spinnerincludes a hubfor connecting to a motor, and one or more bladesconnected to the hub. In particular, the one or more bladesare operative to rotate around the hubon a plane to drive a fluid flow of the precursor gases G, G, so as to distribute the precursor gases G, Gacross the surface of the substrate

Growing community of inventors

Singapore, Singapore

Zilan Li