Company Filing History:
Years Active: 2024
Title: Innovations of Zhongyuan Jiang in Magnetic Tunnel Junction Technology
Introduction
Zhongyuan Jiang is a prominent inventor based in Jiangsu, China. He has made significant contributions to the field of magnetic tunnel junction technology, holding a total of 3 patents. His work focuses on enhancing the performance and reliability of MRAM devices through innovative etching methods.
Latest Patents
Zhongyuan Jiang's latest patents include a multilayer magnetic tunnel junction etching method and an MRAM device. This method involves processing a wafer according to specific steps without interrupting vacuum conditions. The use of a reactive ion plasma etching chamber and an ion beam etching chamber separately at least once ensures that the processing of the multilayer magnetic tunnel junction occurs in a vacuum environment. This approach minimizes the impact of external conditions on the etching process. By combining etching and cleaning processes, the device structure maintains good steepness, significantly reducing metal contamination and damage to the magnetic tunnel junction film structure. This innovation greatly enhances the performance and reliability of the device. Additionally, the dual use of both etching chambers addresses the limitations of existing single etching methods, thereby improving production efficiency and etching precision.
Career Highlights
Zhongyuan Jiang is currently employed at Jiangsu Leuven Instruments Co. Ltd., where he continues to develop cutting-edge technologies in the field of magnetic tunnel junctions. His expertise and innovative approaches have positioned him as a key figure in advancing MRAM device technology.
Collaborations
Zhongyuan has collaborated with notable colleagues, including Ziming Liu and Juebin Wang, contributing to a dynamic research environment that fosters innovation and technological advancement.
Conclusion
Zhongyuan Jiang's contributions to magnetic tunnel junction technology through his innovative etching methods have significantly impacted the field. His work not only enhances device performance but also addresses critical challenges in the manufacturing process.