Zhong-Hao Chen

Title: Innovations of Zhong-Hao Chen

Introduction

Zhong-Hao Chen is a notable inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a patent that enhances semiconductor device fabrication.

Latest Patents

Zhong-Hao Chen holds a patent for a semiconductor device and the method of forming it. The patent describes a method that includes forming a gate structure over a substrate. It also involves creating a first and second gate spacer on opposite sidewalls of the gate structure. The process includes implanting a first dopant into the substrate to form lightly doped source and drain regions. Additionally, a patterned mask is formed over a portion of the lightly doped drain region, allowing for further implantation of a second dopant to convert the exposed region into a drain region.

Career Highlights

Throughout his career, Zhong-Hao Chen has worked with prominent companies in the semiconductor industry. He has been associated with Taiwan Semiconductor Manufacturing Company Limited and TSMC China Company Limited. His experience in these organizations has contributed to his expertise in semiconductor device development.

Collaborations

Zhong-Hao Chen has collaborated with notable professionals in his field, including Feng Han and Jian Huang. Their joint efforts have further advanced the innovations in semiconductor technology.

Conclusion

Zhong-Hao Chen's contributions to semiconductor technology through his patent and career experiences highlight his role as an influential inventor. His work continues to impact the industry positively.