This inventor holds 4 USPTO granted patents and 1 published patent application. Top assignee: Shanghai Huali Microelectronics Corporation. Active years: 2013-2015.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2013-2015
Title: ZhiBiao Mao: Innovator in Microelectronic Technology
Introduction
ZhiBiao Mao is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of microelectronics, particularly in the development of advanced gate structures and manufacturing methods. With a total of 4 patents, his work has been instrumental in enhancing the efficiency and stability of microelectronic devices.
Latest Patents
One of ZhiBiao Mao's latest patents is titled "Method of forming the gate with the LELE double pattern." This invention focuses on a method for forming a gate using a LELE double pattern, which incorporates an ONO structure (Oxide-SiN-Oxide). The method involves exposing the ONO structure twice and utilizing an advanced patterning film as a mask during polysilicon etching. By replacing the traditional hardmask of silicon oxide with the ONO structure, the process becomes more cost-effective and improves the stability of poly gate processes for nodes at 22/20 nm and below.
Another notable patent is the "Method of manufacturing dual gate oxide devices." This invention outlines a process that begins with coating photoresist on a substrate with an oxide thin film. The method includes steps for etching and forming a dual gate oxide structure, which enhances the performance of microelectronic devices.
Career Highlights
ZhiBiao Mao is currently employed at Shanghai Huali Microelectronics Corporation, where he continues to innovate in the field of microelectronics. His expertise in developing advanced manufacturing techniques has positioned him as a key player in the industry.
Collaborations
ZhiBiao has collaborated with notable coworkers, including Jun Huang and Quanbo Li, contributing to various projects that push the boundaries of microelectronic technology.
Conclusion
ZhiBiao Mao's contributions to microelectronic technology through his innovative patents and work at Shanghai Huali Microelectronics Corporation highlight his significant role in advancing the field. His inventions not only improve manufacturing processes but also enhance the performance of microelectronic devices.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile