This inventor holds 2 USPTO granted patents. Top assignees: Csmc Technologies Fab1 Co., Ltd., Csmc Technologies Fab2 Co., Ltd.. Active years: 2015-2016.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2015-2016
Title: The Innovative Mind of Zhengpei Chen
Introduction
Zhengpei Chen, a prominent inventor located in Jiangsu, China, has made significant contributions to the semiconductor industry. With two patented inventions to his name, Chen has addressed critical challenges in the field, enhancing the performance and reliability of semiconductor devices.
Latest Patents
Zhengpei Chen's most recent patents showcase his prowess in manufacturing semiconductor technologies. The first patent, titled "Method for Manufacturing Semiconductor Device," introduces a solution to a prevalent issue in the prior art where silicon at the edge of an oxide layer in an LDMOS drift region is prone to breakdown. This innovative method outlines a comprehensive process that includes providing a semiconductor substrate with both LDMOS and CMOS regions, forming and removing a sacrificial oxide layer, and using a masking layer to create an effective LDMOS drift region, all while ensuring applicability to BCD processes.
The second patent, "Method for Manufacturing Semiconductor Thick Metal Structure," details a multi-step process for creating a thick metal structure in semiconductors. This involves a thick metal deposition step utilizing a Ti-TiN laminated structure as an anti-reflection layer, followed by a metal patterning step that protects the sidewalls during etching to achieve a near 90-degree tilt angle. The process culminates in the effective passivation of the metal gaps, ultimately allowing for the manufacturing of a thick metal structure with a linewidth and gap of 1.5 μm.
Career Highlights
Zhengpei Chen has had an impactful career driving innovation within the semiconductor field. He has worked at notable companies, including CSMC Technologies Fab2 Co., Ltd. and CSMC Technologies Fab1 Co., Ltd., where he utilized his expertise to push the boundaries of semiconductor manufacturing processes.
Collaborations
Throughout his career, Zhengpei Chen has collaborated with talented individuals such as Shilin Fang and Shu Zhang. These collaborations have fostered a rich environment of innovation, enabling the development of sophisticated technologies that address complex challenges in the semiconductor industry.
Conclusion
Zhengpei Chen exemplifies the spirit of innovation that propels the technology sector forward. His patents not only demonstrate his skill as an inventor but also reflect his commitment to developing solutions that enhance the reliability and efficiency of semiconductor devices. As he continues to push the limits of semiconductor technology, Zhengpei Chen's contributions will undoubtedly influence the industry for years to come.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile