Zhenbin Wang

Title: Zhenbin Wang and OPC Lithography Model Optimization.

Introduction

Zhenbin Wang is an inventor based in Shanghai, China, associated with Shanghai Huali Integrated Circuit Corporation. His patent work addresses the optimization of parameters used in optical proximity correction (OPC) lithography modeling.

Latest Patents

Wang is credited with 1 patent: “System for Optimizing OPC Lithography Model Parameters.” The disclosed method first uses a random-direction search to identify promising parameter combinations near multiple local minima for lens beam focus (BF) and defocus start (DS). It then applies a precise search to determine an optimal combination. By combining these approaches, the method aims to find a solution quickly without requiring an initial search point to be configured manually, while supporting convergence and robustness in OPC model parameter optimization.

Career Highlights

The available information connects Wang’s invention to Shanghai Huali Integrated Circuit Corporation and to the technical challenge of refining OPC lithography model parameters. The patent describes a search strategy intended to improve how BF and DS values are determined during model construction.

Collaborations

The provided information identifies Shanghai Huali Integrated Circuit Corporation as Wang’s company but does not specify individual collaborators or other organizations involved in the patent.

Conclusion

Zhenbin Wang’s patent presents a combined random-direction and precise-search approach for optimizing OPC lithography model parameters, with the goal of finding suitable BF and DS values efficiently and reliably.