This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2005.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2005
Title: Zhen-Cheng Chou and His Microelectronic Fabrication Patent
Introduction
Zhen-Cheng Chou is an inventor associated with Taichung, Taiwan, and Taiwan Semiconductor Manufacturing Company Limited. His patent work addresses methods for processing microelectronic layers with improved fabrication reliability.
Latest Patents
Chou is associated with 1 patent: “Partially Photoexposed Positive Photoresist Layer Blocking Method for Regio-Selectively Processing a Microelectronic Layer.” The method uses a patterned positive photoresist residue as a protective layer inside an aperture while an upper region of a topographic microelectronic layer is processed. The residue is formed through incomplete vertical but complete horizontal exposure and development of a positive photoresist layer that fills the aperture. This approach is intended to enhance the reliability of the microelectronic fabrication.
Career Highlights
Chou’s listed patent reflects work on photoresist patterning and selective processing in microelectronic manufacturing. The disclosed method focuses on protecting a region within an aperture during fabrication.
Collaborations
The listed coworkers associated with Chou are Yong-Shun Liao and Juing-Yi Wu.
Conclusion
Zhen-Cheng Chou’s patent describes a photoresist-based protective technique for regio-selective microelectronic processing, with the goal of improving fabrication reliability.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile