Hangzhou, China

Zhaozhe Deng

This inventor holds 2 USPTO granted patents. Top assignee: Hangzhou City University. Active years: 2023-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Zhaozhe Deng. Retrieved from https://idiyas.com/inventor/zhaozhe-deng

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2023-2025

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2 patents (USPTO):Explore Patents

Title: Zhaozhe Deng: Innovator in Plasma Reactor Technology

Introduction

Zhaozhe Deng is a prominent inventor based in Hangzhou, China. He has made significant contributions to the field of plasma reactor technology, holding two patents that showcase his innovative approach to low-temperature plasma processing.

Latest Patents

Deng's latest patents include a "Plasma reactor having array of coaxial multiple pins and processing low temperature plasma at high efficiency." This invention features a rotating reactor and a fixed reactor, connected by a master tube and branched tubes. The design allows for efficient gas flow management based on the flow rate detected by a flow detector. His second patent, "Low temperature plasma reactor having adaptive rotating electrode," describes a reactor with a rotatable inner electrode and discharging needles. This design eliminates the need for a motor drive, as the gas flow itself drives the rotation.

Career Highlights

Zhaozhe Deng is affiliated with Hangzhou City University, where he continues to advance research in plasma technology. His work has garnered attention for its practical applications in various industries.

Collaborations

Deng collaborates with notable colleagues, including Qi Qiu and Pengfei Wang, contributing to a dynamic research environment that fosters innovation.

Conclusion

Zhaozhe Deng's contributions to plasma reactor technology highlight his role as a leading inventor in this field. His innovative patents reflect a commitment to advancing technology and improving efficiency in plasma processing.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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