The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 17, 2023
Filed:
Feb. 13, 2023
Hangzhou City University, Hangzhou, CN;
Qi Qiu, Hangzhou, CN;
Pengfei Wang, Hangzhou, CN;
Jiahong Fu, Hangzhou, CN;
Xingliang Liu, Hangzhou, CN;
Zhaozhe Deng, Hangzhou, CN;
HANGZHOU CITY UNIVERSITY, Hangzhou, CN;
Abstract
A low-temperature plasma reactor having an adaptive rotating electrode includes a frame. A reaction tube is arranged inside the frame. A fixing cover is arranged on each of two sides of the frame. The fixing cover defines a through hole communicating with an inside of the reaction tube. The through hole in one of the two sides serves as an air inlet hole, and the through hole in the other one of the two sides serves as an air outlet hole. A rotatable inner electrode is arranged inside the reaction tube, a plurality of groups of discharging needles are arranged on a surface of the inner electrode. A rotating fan is arranged on the inner electrode and is disposed on a side of the air inlet hole. The gas flow drives the inner electrode and the discharging needles to rotate, and a motor drive is not required.