Xingliang Liu

Title: Innovations of Xingliang Liu in Plasma Reactor Technology

Introduction

Xingliang Liu is a notable inventor based in Hangzhou, China, recognized for his contributions to plasma reactor technology. With a total of two patents to his name, Liu has made significant advancements in the field of low-temperature plasma processing.

Latest Patents

Liu's latest patents include a "Plasma reactor having array of coaxial multiple pins and processing low temperature plasma at high efficiency." This innovative plasma reactor is designed to efficiently process low-temperature plasma and features a rotating reactor, a fixed reactor, and a master tube. The system intelligently manages gas flow based on predefined thresholds, optimizing the processing capabilities of the reactor.

Another significant patent is the "Low temperature plasma reactor having adaptive rotating electrode." This reactor incorporates a unique design with a rotatable inner electrode and multiple groups of discharging needles. The innovative setup allows for gas flow to drive the rotation of the inner electrode, eliminating the need for a motor drive, thus enhancing efficiency.

Career Highlights

Xingliang Liu is affiliated with Hangzhou City University, where he continues to engage in research and development in the field of plasma technology. His work has garnered attention for its practical applications and innovative designs.

Collaborations

Liu collaborates with esteemed colleagues such as Qi Qiu and Pengfei Wang, contributing to a dynamic research environment that fosters innovation and technological advancement.

Conclusion

Xingliang Liu's work in plasma reactor technology exemplifies the potential of innovative engineering solutions. His patents reflect a commitment to enhancing efficiency in plasma processing, marking him as a significant figure in the field.