The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 18, 2025
Filed:
Feb. 13, 2023
Hangzhou City University, Hangzhou, CN;
Qi Qiu, Hangzhou, CN;
Pengfei Wang, Hangzhou, CN;
Jiahong Fu, Hangzhou, CN;
Xingliang Liu, Hangzhou, CN;
Zhaozhe Deng, Hangzhou, CN;
HANGZHOU CITY UNIVERSITY, Hangzhou, CN;
Abstract
A plasma reactor, configured to process low temperature plasma, includes: a rotating reactor, a fixed reactor, and a master tube. An end of the master tube is connected to two branched tubes, one of the two branched tubes is connected to the rotating reactor, and the other one of the two branched tubes is connected to the fixed reactor. When a flow rate of inlet gas is less than a threshold defined by a flow detector, all the gas enters the rotating reactor from one of the two branched tubes. When the flow rate of the inlet gas is greater than the threshold of the flow detector, a valve is configured to operate to allow a part of the inlet gas that exceeds the threshold to enter the fixed reactor from the other one of the two branched tubes.