Hangzhou, China

Qi Qiu

USPTO Granted Patents = 6 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2023-2025

where 'Filed Patents' based on already Granted Patents

6 patents (USPTO):

Title: Inventor Qi Qiu: Innovations in Plasma Technology

Introduction

Qi Qiu is a prominent inventor based in Hangzhou, China, known for his contributions to plasma technology. With a total of six patents to his name, Qi has developed innovative solutions aimed at enhancing the efficiency and effectiveness of plasma reactors.

Latest Patents

Among Qi Qiu's latest patented inventions is a "Plasma reactor having array of coaxial multiple pins and processing low temperature plasma at high efficiency." This advanced plasma reactor is designed with a rotating reactor, a fixed reactor, and a master tube. It features a flow detector that regulates gas flow based on predefined thresholds, optimizing gas utilization in the reactors.

Another significant invention is the "Dielectric barrier discharging tube having synergistic column of needle electrodes utilizing multi-channels to adsorb catalysts," which includes a quartz tube and high-voltage components. This design employs a unique arrangement of needle electrodes and catalytic blocks to enhance catalyst adsorption, thereby improving overall reaction efficiency.

Career Highlights

Qi has held positions at reputable institutions, including Hangzhou City University and Zhejiang University. His work in academia has provided him with a strong foundation to cultivate his research and development skills, leading to groundbreaking inventions in plasma technology.

Collaborations

Throughout his career, Qi Qiu has collaborated with notable peers, including Pengfei Wang and Qinmin Yang. Their combined expertise has facilitated advancements in their respective fields, highlighting the importance of teamwork in driving innovation.

Conclusion

In summary, Qi Qiu is a distinguished inventor whose patents reflect his commitment to innovation in plasma technology. His work not only contributes to scientific progress but also exemplifies the potential for practical applications that enhance efficiency in various industries.

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