Zeyuan Ni

Title: Zeyuan Ni: Innovator in Semiconductor Manufacturing

Introduction

Zeyuan Ni is a prominent inventor based in Yamanashi, Japan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 2 patents. His innovative approaches have the potential to enhance the efficiency and effectiveness of semiconductor devices.

Latest Patents

Zeyuan Ni's latest patents include a method for selective film formation using a self-assembled monolayer. This film formation method involves preparing a substrate with distinct regions, forming a self-assembled monolayer in one region, and selectively inhibiting film formation in another region. Additionally, he has developed a method for manufacturing semiconductor devices that includes a TiN film. This method comprises multiple cycles of supplying gases and purging, with the inclusion of an inhibitor to control the adsorption of materials on the substrate.

Career Highlights

Zeyuan Ni is currently employed at Tokyo Electron Limited, a leading company in the semiconductor industry. His work focuses on advancing technologies that improve semiconductor manufacturing processes. His expertise and innovative mindset have positioned him as a valuable asset in his field.

Collaborations

Zeyuan Ni collaborates with talented coworkers, including Taiki Kato and Yumiko Kawano. Their combined efforts contribute to the development of cutting-edge technologies in semiconductor manufacturing.

Conclusion

Zeyuan Ni's contributions to semiconductor manufacturing through his patents and work at Tokyo Electron Limited highlight his role as an influential inventor. His innovative methods are paving the way for advancements in the industry.