Zeng Zhao

Title: Zeng Zhao: Innovator in Optical Metrology

Introduction

Zeng Zhao is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of optical metrology, particularly through his innovative methods for analyzing and utilizing landscapes to enhance measurement accuracy. His work is crucial for improving the precision of metrology measurements in various applications.

Latest Patents

Zeng Zhao holds a patent titled "Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology." This patent outlines methods for deriving a partially continuous dependency of metrology metrics on recipe parameters. It also discusses analyzing this dependency to determine a metrology recipe and conducting measurements accordingly. The approach includes analyzing process variation effects on the sensitivity landscape, optimizing measurements, and enhancing robustness against inaccuracies.

Career Highlights

Zeng Zhao is associated with Kla Corporation, where he applies his expertise in optical metrology. His innovative methods have the potential to revolutionize measurement techniques, making them more accurate and flexible. His work is recognized for its impact on the industry, particularly in improving measurement conditions and hardware configurations.

Collaborations

Zeng Zhao collaborates with talented professionals such as Tal Marciano and Barak Bringoltz. These partnerships enhance the development and application of his innovative methods in optical metrology.

Conclusion

Zeng Zhao's contributions to optical metrology through his patent and work at Kla Corporation highlight his role as an influential inventor in the field. His innovative methods are paving the way for more accurate and reliable measurement techniques.