Ze'ev Lindenfeld

Title: Ze'ev Lindenfeld: Innovator in Optical Metrology

Introduction

Ze'ev Lindenfeld is a notable inventor based in Modi'n-Macabim-Reut, Israel. He has made significant contributions to the field of optical metrology, particularly through his innovative methods that enhance measurement accuracy. His work is characterized by a deep understanding of the dependencies between metrology metrics and recipe parameters.

Latest Patents

Lindenfeld holds a patent for a "Method of analyzing and utilizing landscapes to reduce or eliminate inaccuracy in overlay optical metrology." This patent outlines methods for deriving a partially continuous dependency of metrology metrics on recipe parameters. It also discusses how to analyze this dependency and determine a metrology recipe based on the analysis. The methods aim to improve measurement accuracy by configuring parameters of measurement, hardware, and targets.

Career Highlights

Ze'ev Lindenfeld is currently associated with Kla Corporation, where he applies his expertise in optical metrology. His innovative approach has led to advancements in the field, particularly in optimizing measurements and making metrology more robust against inaccuracies. His work is essential for achieving high measurement accuracy in various applications.

Collaborations

Lindenfeld collaborates with talented individuals such as Tal Marciano and Barak Bringoltz. These collaborations enhance the innovative environment at Kla Corporation and contribute to the development of cutting-edge metrology solutions.

Conclusion

Ze'ev Lindenfeld's contributions to optical metrology through his innovative patent and collaborative efforts highlight his importance in the field. His work continues to influence advancements in measurement accuracy and metrology practices.