Yvonne LeGrice

Title: Yvonne LeGrice: Innovator in Silicon-Based Technologies

Introduction

Yvonne LeGrice is a prominent inventor based in Mountain View, CA (US). She holds 3 patents that contribute significantly to the field of silicon-based technologies. Her innovative approaches have paved the way for advancements in electronic devices and manufacturing processes.

Latest Patents

One of her latest patents is a method of annealing large area glass substrates. This invention allows for the formation of a thin film layer on a glass substrate by preheating the substrate, depositing an amorphous silicon precursor layer at a first temperature, and subsequently annealing the substrate at a higher temperature. This process effectively reduces the hydrogen concentration in the precursor layer, with the conversion to a polycrystalline silicon layer achieved through laser annealing.

Another notable patent is the method of depositing amorphous silicon-based films with controlled conductivity. This invention describes deposition methods for preparing films with controlled resistivity and low stress, suitable for use in field emission display (FED) manufacturing and other electronic devices. The methods utilize chemical vapor deposition or plasma-enhanced chemical vapor deposition, among other techniques, to achieve the desired film properties.

Career Highlights

Yvonne has worked with several notable companies, including Applied Komatsu Technology, Inc. and Applied Materials, Inc. Her experience in these organizations has allowed her to refine her skills and contribute to significant technological advancements.

Collaborations

Throughout her career, Yvonne has collaborated with talented individuals such as Takako Takehara and Regina Qiu. These partnerships have fostered innovation and creativity in her work.

Conclusion

Yvonne LeGrice's contributions to the field of silicon-based technologies are noteworthy. Her patents reflect her commitment to innovation and her impact on the electronics industry.