Gunma, Japan

Yutaka Ohta


Average Co-Inventor Count = 3.0

ph-index = 8

Forward Citations = 162(Granted Patents)


Location History:

  • Gunma, JP (1992 - 1995)
  • Annaka, JP (1994 - 1996)
  • Gunma-ken, JP (2001)

Company Filing History:


Years Active: 1992-2001

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11 patents (USPTO):Explore Patents

Title: Yutaka Ohta: Innovator in Silicon Wafer Technology

Introduction

Yutaka Ohta is a prominent inventor based in Gunma, Japan. He has made significant contributions to the field of silicon wafer technology, holding a total of 11 patents. His work has been instrumental in advancing methods for analyzing and growing silicon epitaxial layers.

Latest Patents

Among his latest patents is a method for analyzing impurities within silicon wafers. Additionally, he has developed an apparatus for growing silicon epitaxial layers. This innovative apparatus features a central injector that passes a flow of reactive gas through a horizontal chamber, along with peripheral injectors that manage the gas flow around the chamber's edges. The system includes two controllers that independently regulate the mass flows of silicon sources, dopants, and hydrogen, ensuring precise control over the growth process.

Career Highlights

Yutaka Ohta has worked with notable companies in the semiconductor industry, including Shin-Etsu Handotai Co., Ltd. and Shin-Etsu Handotai Kabushiki Kaisha. His experience in these organizations has allowed him to refine his expertise in silicon technology and contribute to various advancements in the field.

Collaborations

Throughout his career, Ohta has collaborated with esteemed colleagues such as Masatake Katayama and Konomu Ohki. These partnerships have fostered innovation and have been crucial in the development of his patented technologies.

Conclusion

Yutaka Ohta's contributions to silicon wafer technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in semiconductor manufacturing.

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