Kumamoto, Japan

Yuta Yoshimura

This inventor holds 2 USPTO granted patents. Top assignee: Tokyo Electron Limited. Active years: 2002-2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yuta Yoshimura. Retrieved from https://idiyas.com/inventor/yuta-yoshimura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 3.4

ph-index = 2

Forward Citations = 31(Granted Patents)


Company Filing History:


Years Active: 2002-2003

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2 patents (USPTO):Explore Patents

Title: Yuta Yoshimura: Innovator in Substrate Processing Technology

Introduction

Yuta Yoshimura is a prominent inventor based in Kumamoto, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 2 patents. His innovative approaches have enhanced the efficiency and effectiveness of heat processing in various applications.

Latest Patents

Yoshimura's latest patents include a substrate processing apparatus designed to improve heat processing for substrates. In this invention, gas for purge, such as nitrogen, is supplied nearly parallel to the substrate placed on a hot plate. This design allows for efficient and uniform exchange of the atmosphere around the substrate, enabling heat processing in a low oxygen atmosphere to be performed quickly and uniformly. Another notable patent is a substrate processing apparatus and method that features a low-oxygen curing and cooling processing station. This apparatus includes multiple blast ports that supply heated inert gas into the heat processing chamber, allowing both faces of the wafer to be heated effectively while maintaining an inert atmosphere.

Career Highlights

Yuta Yoshimura is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work focuses on developing advanced technologies that enhance substrate processing capabilities. His contributions have been instrumental in improving the overall efficiency of heat processing techniques.

Collaborations

Yoshimura has collaborated with notable colleagues, including Kyoshige Katayama and Takeshi Tamura. These partnerships have fostered innovation and have led to the development of cutting-edge technologies in the field.

Conclusion

Yuta Yoshimura's work in substrate processing technology exemplifies the impact of innovative thinking in the semiconductor industry. His patents reflect a commitment to enhancing processing efficiency and effectiveness, making him a key figure in this field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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