The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 25, 2003
Filed:
May. 22, 2000
Applicant:
Inventors:
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05C 1/100 ;
U.S. Cl.
CPC ...
B05C 1/100 ;
Abstract
In a processing chamber for performing heat processing for a substrate, gas for purge, for example, N is supplied nearly parallel to the substrate placed on a hot plate with a gap forming member between them and toward both the front and rear faces of the substrate. Thus, an atmosphere around the substrate can be exchanged for the gas for purge efficiently, and moreover the atmosphere around the substrate can be exchanged uniformly. Accordingly, heat processing in a low oxygen atmosphere can be performed in a short time, and moreover the total time required for substrate processing can be shortened. Besides, heat processing in the low oxygen atmosphere can be performed uniformly.