Hitachinaka, Japan

Yusuke Tanba

This inventor holds 1 USPTO granted patent. Top assignee: Hitachi-High-Technologies Corporation. Active years: 2014.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yusuke Tanba. Retrieved from https://idiyas.com/inventor/yusuke-tanba

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 2014

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1 patent (USPTO):Explore Patents

Title: Yusuke Tanba: Innovator in Charged Particle Beam Technology

Introduction

Yusuke Tanba is a notable inventor based in Hitachinaka, Japan. He has made significant contributions to the field of charged particle beam technology. His innovative work has led to the development of a unique patent that addresses specific challenges in this area.

Latest Patents

Yusuke Tanba holds a patent for a "Charged particle beam apparatus having noise absorbing arrangements." This invention focuses on arrangements in which either a first noise absorber, specialized for a specific frequency range, or a second noise absorber, designed for a different frequency range, or both, are integrated within the cover of the charged particle beam apparatus. This innovation aims to enhance the performance and reliability of charged particle beam systems.

Career Highlights

Tanba is currently employed at Hitachi High-Technologies Corporation, where he continues to push the boundaries of technology. His work at this esteemed company has allowed him to collaborate with other talented professionals in the field.

Collaborations

Some of his notable coworkers include Daisuke Muto and Masanori Watanabe. Their collective expertise contributes to the advancement of technology at Hitachi High-Technologies Corporation.

Conclusion

Yusuke Tanba's contributions to charged particle beam technology exemplify the spirit of innovation. His patent reflects a deep understanding of the challenges faced in this field and offers practical solutions. His ongoing work at Hitachi High-Technologies Corporation continues to influence advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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