Shanghai, China

Yushu Yang

USPTO Granted Patents = 2 

Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2014-2024

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2 patents (USPTO):Explore Patents

Title: Innovative Contributions of Yushu Yang in Semiconductor Technologies

Introduction

Yushu Yang, based in Shanghai, China, is a notable inventor with a record of two patents in the semiconductor field. His work reflects a commitment to advancing the technology behind microelectronics, contributing valuable methodologies that enhance processing efficiency and precision.

Latest Patents

Among Yushu Yang's latest patents is the "Tip-to-tip graphic preparation method." This inventive process includes a method of pattern preparation comprising several layers, formed sequentially on a substrate. The process utilizes Extreme Ultraviolet (EUV) lithography to create a first Tip-to-Tip pattern, which is then transferred to a hard mask layer by etching. This innovative method allows for the creation of diminutive Tip-to-Tip patterns with a halved period, effectively reducing the number of lithography layers required.

Another significant patent is the "Method of forming connection holes." This method leverages two different gases for etching processes on the interlayer dielectric layer to create connection holes. Notably, the etching rates are designed to complement each other, preventing damage to the etching stopper layer and ensuring consistent hole depth. This advancement is crucial in minimizing variations in connection resistance, thereby broadening the process window.

Career Highlights

Yushu Yang has gained considerable experience working with prominent companies in the microelectronics industry, including Shanghai Huali Microelectronics Corporation and Shanghai IC R&D Center Co., Ltd. His roles in these organizations have greatly contributed to his understanding of innovative manufacturing processes and semiconductor technology.

Collaborations

Throughout his career, Yushu Yang has collaborated with skilled professionals such as Cheng Li and Yuwen Chen. These collaborations have likely fostered an environment of innovation and enriched the development of advanced technologies in the semiconductor sector.

Conclusion

Yushu Yang’s innovative patents and career achievements underscore his significant contributions to the semiconductor industry. Through his inventive methods, he has not only advanced his field but has also paved the way for future innovations that enhance microelectronic technology. His work is a testament to the impact of creativity and collaboration in driving technological progress.

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