This inventor holds 3 USPTO granted patents. Top assignee: Nan Ya Technology Corporation. Active years: 2006-2009.
Location History:
- Taipei, TW (2006)
- Taipei Hsien, TW (2009)
Company Filing History:
Years Active: 2006-2009
Title: Yung-Long Hung: Innovator in Phase-Shifting Mask Technology
Introduction
Yung-Long Hung is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of photolithography through his innovative designs of phase-shifting masks. With a total of 3 patents, his work has advanced the capabilities of dense line patterning in semiconductor manufacturing.
Latest Patents
Yung-Long Hung's latest patents include two notable inventions. The first is a "Phase-shifting mask for equal line/space dense line patterns." This invention features a transparent substrate with a partially shielded mesa line pattern of the first phase and a 100% clear recessed line pattern of the second phase. The design allows for a phase difference of 180 degrees between the light passing through the two patterns, enhancing the precision of line patterning.
The second patent is a "Chromeless phase-shifting mask for equal line/space dense line patterns." Similar to the first, this mask includes a transparent substrate and a partially shielded mesa line pattern. However, it incorporates light-shielding regions with 5%-10% transmittance, providing an alternative approach to achieving the desired phase difference in light transmission.
Career Highlights
Yung-Long Hung is currently employed at Nan Ya Technology Corporation, where he continues to innovate in the field of semiconductor technology. His expertise in phase-shifting masks has positioned him as a key player in advancing photolithography techniques.
Collaborations
Yung-Long has collaborated with notable colleagues, including Yuan-Hsun Wu and Chia-Tsung Hung. Their combined efforts have contributed to the development of cutting-edge technologies in the semiconductor industry.
Conclusion
Yung-Long Hung's contributions to phase-shifting mask technology have significantly impacted the semiconductor manufacturing process. His innovative patents reflect his commitment to advancing the field and improving the precision of photolithography.