Yung-Hsing Chang

Title: Yung-Hsing Chang: Innovator in Semiconductor Technology

Introduction

Yung-Hsing Chang is a prominent inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 5 patents. His work focuses on innovative solutions that enhance the efficiency and functionality of semiconductor devices.

Latest Patents

One of Yung-Hsing Chang's latest patents is a semiconductor device package and a method of manufacturing the same. This patent describes a semiconductor device package that includes a first substrate with a first surface and a second surface opposite to the first surface. A second substrate is adjacent to the first surface of the first substrate, and an encapsulant encapsulates both substrates. The first substrate defines a space, which is covered by the second substrate. The second surface of the first substrate is exposed by the encapsulant, and the surface of the encapsulant is either coplanar with or protrudes beyond the second surface of the first substrate.

Career Highlights

Yung-Hsing Chang is currently employed at Advanced Semiconductor Engineering, Inc., where he continues to develop cutting-edge semiconductor technologies. His expertise in this field has led to numerous advancements that benefit the industry.

Collaborations

Throughout his career, Yung-Hsing Chang has collaborated with notable colleagues, including Wen-Hsin Lin and Shih-Ming Huang. These partnerships have fostered innovation and contributed to the success of their projects.

Conclusion

Yung-Hsing Chang is a distinguished inventor whose work in semiconductor technology has made a lasting impact. His patents and collaborations reflect his commitment to advancing the field and improving device performance.