Taipei, Taiwan

Yung Cheng Lu


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 6(Granted Patents)


Company Filing History:


Years Active: 2006

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1 patent (USPTO):Explore Patents

Title: Yung Cheng Lu: Innovator in Semiconductor Technology

Introduction

Yung Cheng Lu is a prominent inventor based in Taipei, Taiwan, known for his significant contributions to the field of semiconductor technology. With a deep understanding of materials and processes, he has developed innovative solutions that enhance the efficiency and reliability of electronic devices.

Latest Patents

Yung Cheng Lu holds a notable patent titled "Method for forming a multi-layer low-K dual damascene." This invention focuses on a damascene structure and method for its formation within a multi-density dielectric insulating layer. The patented method involves providing a substrate and sequentially forming first and second layers of silicon oxide with varying densities. The process includes etching a damascene opening through these layers and filling the opening to create a metal-filled damascene. This innovative approach offers improvements in the manufacturing of semiconductor devices, leading to enhanced performance.

Career Highlights

Lu is affiliated with the Taiwan Semiconductor Manufacturing Company Ltd., a leading global provider of semiconductor manufacturing services. His dedication to research and innovation within the company has contributed to advancements in semiconductor technology, positioning the organization at the forefront of the industry.

Collaborations

Throughout his career, Yung Cheng Lu has collaborated with esteemed colleagues, including Hui Lin Chang and Li Ping Li. Together, they have worked on various projects that aim to improve semiconductor fabrication techniques and enhance device performance, reinforcing the collaborative spirit that drives innovation in this fast-paced field.

Conclusion

Yung Cheng Lu's innovative approach to semiconductor manufacturing, highlighted by his patent in multi-layer low-K dual damascene methods, showcases his expertise and dedication to enhancing technology. His work at the Taiwan Semiconductor Manufacturing Company Ltd. and collaborations with talented colleagues underline the importance of teamwork in fostering groundbreaking advancements in the semiconductor industry.

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