San Jose, CA, United States of America

Yun-Yen Jack Yang


Average Co-Inventor Count = 2.7

ph-index = 5

Forward Citations = 570(Granted Patents)


Company Filing History:


Years Active: 1999-2001

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5 patents (USPTO):

Title: Innovations of Yun-Yen Jack Yang

Introduction

Yun-Yen Jack Yang is a prominent inventor based in San Jose, CA. He has made significant contributions to the field of semiconductor fabrication, holding a total of 5 patents. His work focuses on advanced processes that enhance the efficiency and effectiveness of semiconductor manufacturing.

Latest Patents

One of his latest patents is titled "Metal and metal silicide nitridization in a high density, low pressure plasma reactor." This patent describes a nitridization process that forms a barrier layer on a substrate. The process involves depositing a layer of metal or metal silicide on the substrate's surface, placing the substrate into a high-density, low-pressure plasma reactor, and introducing nitrogen gas to promote nitridization. This results in the production of metal nitride or metal silicon nitride.

Another notable patent is "Methods and compositions for post-etch layer stack treatment in semiconductor fabrication." This patent provides methods for treating a wafer's layer stack after metal etching. The methods utilize a plasma processing system and involve treating the layer stack with process gases that include helium and water or oxygen. These methods significantly reduce corrosion and polymer fence issues, decrease passivation time, and improve strip uniformity.

Career Highlights

Yun-Yen Jack Yang is currently employed at Lam Research Corporation, a leading company in semiconductor equipment manufacturing. His work at Lam Research has positioned him as a key player in the development of innovative solutions for semiconductor processing.

Collaborations

He has collaborated with notable coworkers such as Changhun Lee and Vikram Singh, contributing to advancements in semiconductor technologies.

Conclusion

Yun-Yen Jack Yang's innovative patents and contributions to semiconductor fabrication highlight his expertise and commitment to advancing technology in this critical field. His work continues to influence the industry and pave the way for future innovations.

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